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China Extreme Ultraviolet Lithography Market

ID: MRFR/SEM/55772-HCR
200 Pages
Aarti Dhapte
February 2026

China Extreme Ultraviolet (EUV) Lithography Market Size, Share and Research Report By Equipment (Light, Source, Optics, Mask, Others) and By End-user (Integrated Device Manufacturer (IDM), Foundries)-Forecast to 2035

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China Extreme Ultraviolet Lithography Market Summary

As per MRFR analysis, the China Extreme Ultraviolet Euv Lithography Market is projected to grow from USD 2.81 Billion in 2025 to USD 17.48 Billion by 2035, exhibiting a compound annual growth rate (CAGR) of 20.26% during the forecast period (2025 - 2035).

Key Market Trends & Highlights

The China Extreme Ultraviolet Euv Lithography Market is poised for substantial growth driven by technological advancements and increasing demand for high-performance semiconductors.

  • The Semiconductor Manufacturing segment remains the largest contributor to the market, reflecting robust demand for advanced chip production.
  • The Microelectronics segment is currently the fastest-growing, indicating a shift towards more sophisticated electronic applications.
  • Collaboration between domestic and international firms is enhancing innovation and competitiveness within the market.
  • Increased government investment and a rising focus on domestic semiconductor production are key drivers propelling market expansion.

Market Size & Forecast

2024 Market Size 2.3 (USD Billion)
2035 Market Size 17.48 (USD Billion)
CAGR (2025 - 2035) 20.26%

Major Players

ASML (NL), SMIC (CN), Huawei (CN), Nikon (JP), Canon (JP), Tsinghua Unigroup (CN), Shanghai Micro Electronics Equipment (CN), Advanced Micro Devices (US)

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China Extreme Ultraviolet Lithography Market Trends

The China Extreme Ultraviolet Euv Lithography Market is currently experiencing a transformative phase, driven by the increasing demand for advanced semiconductor manufacturing technologies. As the nation aims to enhance its position in the global semiconductor supply chain, investments in EUV lithography systems are becoming more pronounced. This technology, which enables the production of smaller and more efficient chips, is crucial for meeting the needs of various sectors, including consumer electronics, automotive, and telecommunications. The Chinese government has been actively promoting initiatives to bolster domestic semiconductor capabilities, which further fuels the growth of the EUV lithography market. Moreover, the competitive landscape within the China Extreme Ultraviolet Euv Lithography Market is evolving, with both domestic and international players vying for market share. Local companies are increasingly collaborating with The Extreme Ultraviolet Euv Lithography requirements. This collaboration not only enhances technological capabilities but also fosters innovation within the industry. As the market matures, it appears that the focus will shift towards optimizing production processes and reducing costs, which may lead to a more sustainable and resilient semiconductor ecosystem in China.

Increased Government Support

The Chinese government is intensifying its support for the semiconductor industry, particularly in the realm of EUV lithography. This backing includes funding initiatives and policy frameworks aimed at fostering innovation and enhancing domestic production capabilities. Such measures are likely to accelerate the development and adoption of EUV technologies within the country.

Rising Demand for Advanced Chips

There is a growing demand for advanced semiconductor chips across various sectors in China, including telecommunications and consumer electronics. This trend is driving the need for EUV lithography, as it allows for the production of smaller, more efficient chips. As industries evolve, the reliance on cutting-edge lithography techniques is expected to increase.

Collaboration Between Domestic and International Firms

The China Extreme Ultraviolet Euv Lithography Market is witnessing a trend of collaboration between local companies and international technology leaders. These partnerships aim to leverage expertise and resources to enhance the development of EUV systems. Such collaborations may lead to innovations that cater specifically to the unique needs of the Chinese market.

China Extreme Ultraviolet Lithography Market Drivers

Increased Government Investment

The China Extreme Ultraviolet Euv Lithography Market is experiencing a surge in government investment aimed at bolstering domestic semiconductor manufacturing capabilities. The Chinese government has allocated substantial funds to support research and development in advanced lithography technologies. This financial backing is crucial as it enables local companies to enhance their technological prowess and reduce reliance on foreign suppliers. In 2025, the government announced a multi-billion dollar initiative to promote the development of EUV lithography systems, which is expected to significantly boost production capacity. As a result, the market is likely to witness accelerated growth, with projections indicating a compound annual growth rate (CAGR) of over 15% through 2030. This investment not only strengthens the domestic supply chain but also positions China as a formidable player in the global semiconductor landscape.

Strategic Collaborations and Partnerships

The China Extreme Ultraviolet Euv Lithography Market is witnessing a trend of strategic collaborations and partnerships among domestic and international firms. These alliances are formed to leverage complementary strengths, share technological expertise, and accelerate the development of EUV lithography systems. For instance, several Chinese semiconductor manufacturers have entered into partnerships with leading global technology firms to enhance their capabilities in EUV lithography. Such collaborations not only facilitate knowledge transfer but also enable access to advanced technologies that may not be readily available domestically. As a result, the market is likely to benefit from improved innovation and faster time-to-market for new products. This collaborative approach is expected to foster a more robust ecosystem for Euv lithography in China, ultimately contributing to the growth of the industry.

Technological Advancements in Lithography

Technological advancements in lithography are significantly impacting the China Extreme Ultraviolet Euv Lithography Market. Innovations in EUV lithography technology are enabling manufacturers to produce smaller and more complex semiconductor devices with higher precision. In 2025, advancements in Euv light sources and optics have led to improved resolution and throughput, making Euv lithography more viable for mass production. These developments are crucial as they allow Chinese semiconductor manufacturers to compete effectively on a global scale. Furthermore, the continuous evolution of lithography technology is expected to drive investment in research and development, fostering a culture of innovation within the industry. As a result, the market is likely to experience sustained growth, with companies striving to adopt the latest technologies to enhance their production capabilities.

Rising Focus on Domestic Semiconductor Production

The rising focus on domestic semiconductor production is a key driver for the China Extreme Ultraviolet Euv Lithography Market. In light of global supply chain disruptions and geopolitical tensions, there is an increasing emphasis on self-sufficiency in semiconductor manufacturing. The Chinese government has implemented policies to encourage local production, aiming to reduce dependence on foreign technology and components. In 2025, initiatives were launched to establish domestic EUV lithography production facilities, which are expected to enhance the country's manufacturing capabilities. This shift towards local production not only strengthens the domestic supply chain but also creates opportunities for growth within the Euv lithography market. As companies invest in building local capabilities, the market is likely to expand, driven by the need for reliable and advanced semiconductor manufacturing solutions.

Growing Demand for High-Performance Semiconductors

The demand for high-performance semiconductors in China is driving the growth of the Extreme Ultraviolet Euv Lithography Market. With the rapid advancement of technologies such as artificial intelligence, 5G, and the Internet of Things, there is an increasing need for chips that can handle complex computations and data processing. In 2025, the semiconductor market in China was valued at approximately USD 150 billion, with EUV lithography playing a pivotal role in producing smaller, more efficient chips. This trend is expected to continue, as industries increasingly adopt advanced technologies that require cutting-edge semiconductor solutions. Consequently, the EUV lithography market is poised for expansion, as manufacturers strive to meet the escalating demand for high-performance chips, thereby enhancing their competitive edge in the global market.

Market Segment Insights

By Application: Semiconductor Manufacturing (Largest) vs. Microelectronics (Fastest-Growing)

In the China Extreme Ultraviolet (EUV) Lithography Market, the application segment is predominantly driven by semiconductor manufacturing, which holds the largest market share due to its critical role in producing advanced chips. Semiconductor manufacturing leverages EUV lithography for its ability to create smaller, more powerful integrated circuits, catering to the increasing demand from various sectors including consumer electronics and telecommunications. In contrast, microelectronics is emerging rapidly as a significant application area, capturing attention for its innovative solutions and the shift towards miniaturization in electronic components.

Semiconductor Manufacturing (Dominant) vs. Microelectronics (Emerging)

Semiconductor manufacturing is the dominant application in the EUV lithography market, characterized by its reliance on cutting-edge technology to produce high-performance chips that serve a plethora of industries. It benefits from well-established practices and substantial investments, fostering growth within the sector. Conversely, microelectronics is seen as an emerging application area that is gaining traction due to advancements in technology and the growing demand for compact, efficient electronic devices. This segment is driven by trends such as IoT, artificial intelligence, and 5G technology, which require sophisticated microelectronic components to function optimally. As a result, microelectronics is poised to capture significant market attention and investment, presenting new opportunities for innovation.

By End Use: Consumer Electronics (Largest) vs. Telecommunications (Fastest-Growing)

In the China Extreme Ultraviolet (EUV) Lithography market, the end-use segment distribution showcases Consumer Electronics as the largest segment. This can be attributed to the booming demand for advanced semiconductor technology within devices such as smartphones, tablets, and gaming consoles. The rising consumption of consumer electronics drives manufacturers to adopt EUV lithography solutions to enhance their production capabilities and maintain technological competitiveness. On the other hand, the Telecommunications sector is recognized as the fastest-growing segment in this market. With the ongoing expansion of 5G networks and the increasing popularity of Internet of Things (IoT) devices, telecom companies are investing substantially in advanced lithography technologies. This shift aims to produce high-performance chips that meet the escalating data transfer requirements and bolster connectivity across various applications, fostering growth within the EUV market.

Consumer Electronics: Dominant vs. Telecommunications: Emerging

Consumer Electronics remains the dominant segment in the China EUV lithography market, driven by a continuous surge in the production of smart devices, which necessitate high-performance semiconductors. Manufacturers are keen on adopting cutting-edge EUV technology to meet the demands for smaller, more efficient, and powerful chips. In contrast, Telecommunications is emerging rapidly due to the accelerated rollout of 5G networks. The need for sophisticated chip designs that facilitate faster data speeds and greater connectivity drives the demand for EUV lithography in this sector. As these two segments evolve, they will play significant roles in shaping technological advancements in the semiconductor industry, with Consumer Electronics serving as the foundation and Telecommunications driving future innovations.

By Technology: Maskless Lithography (Largest) vs. Nanoimprint Lithography (Fastest-Growing)

In the China Extreme Ultraviolet (EUV) Lithography Market, Maskless Lithography is currently the largest segment, dominating due to its efficiency and minimal material waste. On the other hand, Nanoimprint Lithography is gaining traction as the fastest-growing segment, appealing to industries seeking cost-effective and high-resolution patterning solutions. Photonic Devices and Laser Lithography follow, contributing to a diverse technological landscape that supports various semiconductor applications. This distribution reflects an evolving market dynamic that prioritizes innovation and production efficiency. The growth trends in this segment are driven by an increasing demand for high-precision manufacturing techniques in the semiconductor industry. As complexities in chip designs rise, technologies like Maskless and Nanoimprint Lithography present significant opportunities for market players. Additionally, advancements in materials and processes are enhancing the capabilities of these technologies, leading to a competitive edge in the market. Strong investment in R&D is further propelling the adoption of these cutting-edge lithography techniques across China’s rapidly evolving technology sector.

Technology: Maskless Lithography (Dominant) vs. Nanoimprint Lithography (Emerging)

Maskless Lithography stands out as the dominant technology in China’s EUV lithography market, attributed to its ability to offer precision masking capabilities, leading to reduced production costs and increased efficiency. This technology is critical for the microelectronics sector, where chip sizes and complexities are continually increasing. In contrast, Nanoimprint Lithography is emerging as a formidable contender due to its potential for low-cost manufacturing and exceptional resolution. As manufacturers seek innovative ways to meet the demands of smaller semiconductor geometries, Nanoimprint Lithography is gaining momentum, particularly in high-throughput applications. Together, these technologies exemplify the dynamic and competitive landscape of the lithography market in China, underscoring the importance of continual innovation.

By Component Type: Light Source (Largest) vs. Optical Components (Fastest-Growing)

In the China Extreme Ultraviolet (EUV) lithography market, the component type segment is primarily dominated by the Light Source, which commands a significant share of the market. Following closely, Optical Components such as lenses and mirrors play an essential role, contributing to overall efficiency and precision. Mask Blanks and Photoresists also make their presence felt, albeit with a smaller representation in market share, as they are critical in the process of image transfer within the lithography systems.

Optical Components: Light Source (Dominant) vs. Mask Blanks (Emerging)

The Light Source remains the dominant player in the China EUV lithography market due to its crucial role in generating the extreme ultraviolet light required for high-resolution patterning. This component allows for finer resolution in chip manufacturing, supporting advanced semiconductor technology. In contrast, Mask Blanks are emerging as a key component as they are integral to the photomask fabrication process, which is essential for defining patterns on semiconductor wafers. The evolution of materials and technology in Mask Blanks is paving the way for enhanced performance, opening new avenues for growth in response to increasing demands for higher circuit densities.

Get more detailed insights about China Extreme Ultraviolet Lithography Market

Key Players and Competitive Insights

The Extreme Ultraviolet Euv Lithography Market in China is characterized by a dynamic competitive landscape, driven by rapid technological advancements and increasing demand for high-performance semiconductor manufacturing. Key players such as ASML (NL), SMIC (CN), and Huawei (CN) are at the forefront, each adopting distinct strategies to enhance their market positioning. ASML (NL) continues to lead in innovation, focusing on the development of next-generation lithography systems, while SMIC (CN) emphasizes local production capabilities to reduce dependency on foreign technology. Huawei (CN), on the other hand, is investing heavily in R&D to bolster its semiconductor design capabilities, indicating a strategic pivot towards self-sufficiency in the face of geopolitical challenges. Collectively, these strategies contribute to a competitive environment that is increasingly focused on technological leadership and local market adaptation.

In terms of business tactics, companies are localizing manufacturing and optimizing supply chains to enhance operational efficiency. The market structure appears moderately fragmented, with several players vying for dominance. However, the influence of major companies like ASML (NL) and SMIC (CN) is substantial, as they set the pace for innovation and market trends. This competitive structure fosters an environment where collaboration and strategic partnerships are essential for survival and growth.

In December 2025, ASML (NL) announced a partnership with SMIC (CN) to co-develop advanced lithography systems tailored for the Chinese market. This collaboration is significant as it not only strengthens ASML's foothold in China but also enhances SMIC's technological capabilities, potentially leading to breakthroughs in semiconductor manufacturing. The partnership underscores the importance of localized innovation in a rapidly evolving market.

In November 2025, Huawei (CN) unveiled its new semiconductor design platform, which aims to streamline the development of chips for various applications. This strategic move is crucial as it positions Huawei to compete more effectively against established players, allowing for greater flexibility and responsiveness to market demands. The platform's introduction may also signify a shift towards more integrated solutions within the semiconductor ecosystem.

In October 2025, Nikon (JP) expanded its manufacturing facility in China, focusing on the production of Euv lithography equipment. This expansion reflects Nikon's commitment to increasing its market share in the region and highlights the growing demand for advanced lithography solutions. By enhancing its production capabilities, Nikon is likely to improve its competitive stance against other key players.

As of January 2026, the competitive trends in the Extreme Ultraviolet Euv Lithography Market are increasingly defined by digitalization, sustainability, and AI integration. Strategic alliances are becoming more prevalent, as companies recognize the need for collaboration to navigate complex technological landscapes. Looking ahead, competitive differentiation is expected to evolve, with a shift from price-based competition to a focus on innovation, technology, and supply chain reliability. This transition may redefine market dynamics, emphasizing the importance of strategic partnerships and technological advancements in maintaining a competitive edge.

Key Companies in the China Extreme Ultraviolet Lithography Market include

Industry Developments

In recent months, China's Extreme Ultraviolet (EUV) Lithography market has seen significant developments. Notably, there is a strong emphasis on self-reliance in semiconductor technology amidst ongoing geopolitical tensions.

In September 2023, the Shanghai Micro Electronics Equipment Group announced advancements in its EUV lithography equipment, aimed at reducing reliance on foreign technologies. Taiwan Semiconductor Manufacturing Company has been increasing its collaborations within China to enhance local manufacturing capabilities, signaling a trend towards domestic supply chain enhancements.

Current market dynamics indicate that companies like ASML and Canon are closely monitoring China's advancements, with implications for global supply chains.

Merger and acquisition activity remains scarce; however, there have been discussions reported around potential partnerships among companies like GlobalFoundries and local entities to bolster technological cooperation in China, particularly in the EUV segment.

The growth trajectory for companies such as Qualcomm, Micron Technology, and Samsung Electronics continues to be influenced by developments in China's semiconductor policy, reflecting a broader strategy to achieve technological sovereignty while fostering innovative solutions in the lithography landscape.

China Extreme Ultraviolet (EUV)

Future Outlook

China Extreme Ultraviolet Lithography Market Future Outlook

The China Extreme Ultraviolet Euv Lithography Market is projected to grow at a 20.26% CAGR from 2025 to 2035, driven by technological advancements and increasing semiconductor demand.

New opportunities lie in:

  • Development of localized supply chains for EUV components.
  • Investment in R&D for next-generation lithography techniques.
  • Partnerships with semiconductor firms for tailored EUV solutions.

By 2035, the market is expected to solidify its position as a leader in advanced lithography solutions.

Market Segmentation

China Extreme Ultraviolet Lithography Market End Use Outlook

  • Consumer Electronics
  • Telecommunications
  • Automotive
  • Aerospace

China Extreme Ultraviolet Lithography Market Technology Outlook

  • Maskless Lithography
  • Photonic Devices
  • Nanoimprint Lithography
  • Laser Lithography

China Extreme Ultraviolet Lithography Market Application Outlook

  • Semiconductor Manufacturing
  • Microelectronics
  • Optoelectronics
  • Nanotechnology

China Extreme Ultraviolet Lithography Market Component Type Outlook

  • Light Source
  • Optical Components
  • Mask Blanks
  • Photoresists

Report Scope

MARKET SIZE 20242.3(USD Billion)
MARKET SIZE 20252.81(USD Billion)
MARKET SIZE 203517.48(USD Billion)
COMPOUND ANNUAL GROWTH RATE (CAGR)20.26% (2024 - 2035)
REPORT COVERAGERevenue Forecast, Competitive Landscape, Growth Factors, and Trends
BASE YEAR2024
Market Forecast Period2025 - 2035
Historical Data2019 - 2024
Market Forecast UnitsUSD Billion
Key Companies ProfiledASML (NL), SMIC (CN), Huawei (CN), Nikon (JP), Canon (JP), Tsinghua Unigroup (CN), Shanghai Micro Electronics Equipment (CN), Advanced Micro Devices (US)
Segments CoveredApplication, End Use, Technology, Component Type
Key Market OpportunitiesGrowing demand for advanced semiconductor manufacturing drives innovation in the China Extreme Ultraviolet Euv Lithography Market.
Key Market DynamicsIntensifying competition and regulatory shifts drive innovation in China's Extreme Ultraviolet Lithography Market.
Countries CoveredChina
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FAQs

What is the current valuation of the China Extreme Ultraviolet Euv Lithography Market?

The market valuation was 2.3 USD Billion in 2024.

What is the projected market size for the China Extreme Ultraviolet Euv Lithography Market by 2035?

The market is expected to reach 17.48 USD Billion by 2035.

What is the expected CAGR for the China Extreme Ultraviolet Euv Lithography Market during the forecast period?

The expected CAGR for the market from 2025 to 2035 is 20.26%.

Which companies are considered key players in the China Extreme Ultraviolet Euv Lithography Market?

Key players include ASML, SMIC, Huawei, Nikon, Canon, Tsinghua Unigroup, Shanghai Micro Electronics Equipment, and Advanced Micro Devices.

How does the Semiconductor Manufacturing segment perform in the China Extreme Ultraviolet Euv Lithography Market?

The Semiconductor Manufacturing segment was valued at 1.15 USD Billion in 2024 and is projected to grow to 8.5 USD Billion by 2035.

What is the projected growth for the Microelectronics segment in the China Extreme Ultraviolet Euv Lithography Market?

The Microelectronics segment was valued at 0.75 USD Billion in 2024 and is expected to reach 5.5 USD Billion by 2035.

What are the expected valuations for the Optoelectronics segment by 2035?

The Optoelectronics segment was valued at 0.25 USD Billion in 2024 and is projected to grow to 2.5 USD Billion by 2035.

What is the anticipated market size for the Automotive sector within the China Extreme Ultraviolet Euv Lithography Market?

The Automotive sector was valued at 0.4 USD Billion in 2024 and is expected to reach 3.0 USD Billion by 2035.

How does the Laser Lithography technology segment perform in the market?

The Laser Lithography segment was valued at 0.81 USD Billion in 2024 and is projected to grow to 6.04 USD Billion by 2035.

What is the expected valuation for the Light Source component type by 2035?

The Light Source component type was valued at 0.69 USD Billion in 2024 and is projected to reach 5.25 USD Billion by 2035.

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