ALD Equipment for Chemical Application Market Research Report Information By Wafer Size (Up to 150 mm, 200 mm, 300 mm) By Deposition Method (Plasma-Enhanced, Thermal, Spatial, Roll-to-Roll, Powder, Others), By Film Type (Oxide, Metal, Sulfide, Nitride, Flouride), By Application (Catalyst Deposition, Surface Modification, Others) and By Region (North America, Europe, Asia-Pacific, South America, Middle East & Africa)-Global Forecast to 2032

Global ALD Equipment for Chemical Application Market Overview

ALD Equipment for Chemical Application Market Size was valued at USD  1,48,377.2 Thousand in 2022. The ALD Equipment for Chemical Application industry is projected to grow from USD  1,53,074.9 Thousand in 2023 to USD  2,70,596.3 Thousand by 2032, exhibiting a compound annual growth rate (CAGR) of 6.53% during the forecast period (2023 - 2032). The ALD Equipment market shows the substantial growth, driven by increasing demand for advanced semiconductors and nanotechnology applications. Key drivers include the rising adoption of ALD in electronics and semiconductor manufacturing, fueled by the need for precision and miniaturization. ALD Equipment plays a pivotal role in catalyst deposition and surface modification, offers unparalleled precision in these applications. In catalyst deposition, ALD ensures uniform and controlled coating on catalytic surfaces, enhancing efficiency in chemical processes. For surface modification, the equipment enables atomic-level adjustments, tailoring material properties with accuracy. This capability proves crucial in optimizing surface functionalities for improved adhesion, corrosion resistance, and other tailored characteristics. ALD's versatility in these applications positions it as a cornerstone technology, contributing to advancements in catalysis and tailored material design across various industries.

Source: Secondary Research, Primary Research, MRFR Database and Analyst Review

ALD Equipment for Chemical Application Market Trends

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  RAPID EXPANSION OF SEMICONDUCTOR INDUSTRY

  
  

Atomic Layer Deposition (ALD) is known in the electronics industry as an enabler for the scaling of logic and memory semiconductor devices. Ultimately, this scaling leads to performance improvement of devices such as dynamic random-access memory (DRAM), advanced fin field effect transistor (FinFET) and Gate All Around transistors. ALD is now percolating into More-than-Moore (MtM) device production, again enabling novel architectures, materials, and performance improvements. Examples include GaN and SiC transistors, in particular GaN High Electron Mobility Transistors (HEMTs) and SiC trench metal oxide semiconductor FETs (MOSFETs), piezoelectric microelectromechanical systems (MEMS) and radiofrequency (RF) devices or compound semiconductor mini-light emitting diodes (LEDs) and micro-LEDs.

Atomic Layer Deposition (ALD) equipment for the semiconductor industry is used for depositing ultra-thin layers of materials onto a substrate. This technique is commonly used in the fabrication of semiconductors, where precise control over the material thickness and quality is crucial. The ALD equipment for the semiconductor market is expected to witness significant growth in the coming years. The increasing demand for smaller and more efficient electronic devices, such as smartphones, tablets, and wearables, is driving the need for advanced semiconductor fabrication technologies. ALD offers excellent control over the deposition process, enabling the creation of high-quality, atomically precise thin films. This makes it an ideal choice for various semiconductor applications, including gate dielectrics, passivation layers, and metal and metal nitride films.

MULTIPLE BENEFITS OFFERED BY ALD EQUIPMENT

Atomic Layer Deposition (ALD) equipment offers a numerous of benefits across various sectors due to its precision, uniformity, and versatility in thin film deposition. In the energy storage, ALD plays a crucial role in enhancing the performance and longevity of batteries. By coating electrode materials with thin, protective layers, ALD helps mitigate issues like capacity degradation and enhances the overall efficiency of lithium-ion batteries. This application is vital for electric vehicles, portable electronics, and renewable energy storage systems. In the field of optics and coatings, ALD enables the creation of thin films with tailored optical properties. It is used to manufacture anti-reflective coatings on lenses, improving the clarity and efficiency of optical systems in cameras, microscopes, and other devices. Additionally, ALD is used in creating protective coatings for eyeglasses and displays, enhancing scratch resistance and durability.

ALD is also utilized in the development of advanced sensors. By depositing thin films on sensor surfaces, it enhances sensitivity and selectivity, crucial for applications in gas sensing, environmental monitoring, and medical diagnostics. The controlled deposition allows for the customization of sensor properties, optimizing performance for specific applications. In the aerospace and automotive industries, it contributes to the development of lightweight and high-performance materials. The technology is used to coat components with protective layers, preventing corrosion and improving durability in harsh environments. This is particularly important for extending the lifespan of critical components in aircraft and automotive systems.

SURGING DEMAND FOR PHOTOVOLTAICS

The surging demand for photovoltaics (PV), driven by the global shift towards renewable energy sources, presents a significant opportunity for the global adoption of Atomic Layer Deposition (ALD) equipment. ALD plays a crucial role in enhancing the efficiency, reliability, and longevity of solar cells, aligning well with the growing needs of the photovoltaic industry. One of the important aspects is the improvement of thin-film deposition on solar cell surfaces. ALD's atomic precision allows for the creation of ultra-thin and uniform layers on photovoltaic substrates, reducing defects and enhancing light absorption. This results in improved conversion efficiency, which is a critical factor for the economic viability of solar energy.

ALD Equipment for Chemical Application Market Segment Insights

ALD Equipment Market Report for Chemical Application by Wafer Size Insights

The ALD Equipment for Chemical Application Market segmentation, based on Wafer Size has been segmented as Up to 150 mm, 200 mm and 300 mm. Among these, the 300 mm segment is projected to dominate the ALD Equipment for Chemical Application Market revenue through the projected period. ALD equipment tailored for 300 mm wafers represents a pivotal shift in the semiconductor industry towards larger wafer sizes. This transition enables enhanced efficiency and scalability in production, to meet the growing demand for electronic devices.

ALD Equipment Market Report for Chemical Application by Deposition Method Insights

Based on Deposition Method, the ALD Equipment for Chemical Application Market is segmented as Plasma-Enhanced, Thermal, Spatial, Roll-to-Roll, Powder, Others. Plasma-Enhanced segment dominated base year market and is also projected to dominate the ALD Equipment for Chemical Application Market revenue through the projected period. Plasma-enhanced ALD revolutionizes thin film deposition by introducing plasma into the process, which helps in elevating film quality. This cutting-edge technique finds applications in crafting advanced semiconductor devices, ensuring precision in their design.

ALD Equipment Market Report for Chemical Application by Film Type

The ALD Equipment for Chemical Application Market segmentation, based on Film Type has been segmented as Oxide, Metal, Sulfide, Nitride, Flouride. Among these, the Oxide segment is projected to dominate the ALD Equipment for Chemical Application Market revenue through the projected period. ALD equipment plays a key role in depositing oxide films like silicon dioxide (SiO2) and aluminum oxide (Al2O3). These films are essential for providing insulation and passivation to semiconductor devices. Silicon dioxide serves as a crucial insulator, while aluminum oxide acts as a protective layer.

ALD Equipment Market Report for Chemical Application by Application

Based on Application, the ALD Equipment for Chemical Application Market is segmented as Catalyst Deposition, Surface Modification, Others. Out of which the Surface Modification segment dominated base year market and is also projected to dominate the ALD Equipment for Chemical Application Market revenue through the projected period. Surface deposition by ALD technology involves the precise application of thin films onto material surfaces. This method is extensively employed for surface modification, imparting desirable properties like enhanced conductivity, corrosion resistance, and biocompatibility.

ALD Equipment Market Report for Chemical Application Regional Insights

Based on Region, the ALD Equipment for Chemical Application Market is segmented into North America, Europe, Asia-Pacific, Middle East & Africa, and South America. The Asia-Pacific ALD Equipment for Chemical Application Market held the maximum market share and is also expected to account for a significant revenue share during the forecast period. Asia Pacific stands out as a powerhouse in the worldwide ALD equipment market, fueled by major semiconductor hubs in China, South Korea, Japan, and Taiwan. The region experiences sustained growth in electronics and semiconductor industries, accompanied by significant investments in research and development, amplifying the demand for ALD equipment in chemical applications.

ALD Equipment Market Report for Chemical Application Key Market Players & Competitive Insights

Key market players are emphasizing significantly on R&D for increasing their product offerings, which will further help the ALD Equipment for Chemical Application Market to grow considerably. Market players are adopting several business development strategies such as acquisitions, mergers, collaborations, and partnerships to enhance their market presence and acquire a larger customer base. To survive in the competitive market, industry players must provide cost effective products.

The ALD Equipment for Chemical Application Market is very competitive with market players trying to develop unique and innovative products and solutions, which could render the competitors’ offerings obsolete. The competitive environment is likely to grow further owing to rising technological advancements. Some of the key players operating in the ALD Equipment for Chemical Application Market are Applied Materials, Inc., Tokyo Electron Limited, Lam Research Corporation, Veeco Instruments Inc, Kurt J. Lesker Company, Eugenus Inc., Beneq, Forge Nano, ANRIC Technologies, Levitech. To increase their global reach and client base, key firms are concentrating on acquisitions and product innovation.

Applied Materials, Inc.: Applied Materials, Inc. is a leader in materials engineering solutions that are used to produce semiconductor devices called chips. The company’s expertise in modifying materials at atomic levels and on an industrial scale enable customers to transform possibilities into reality. Its product and technology include semiconductors, display, roll to roll web coating, solar, automation software. It possesses a broad and deepest technology portfolio that enables them to produce and modify the materials that comprise their surface, mechanical, physical, or electronic characteristics. Through highly sophisticated methods of deposition, extraction, transformation and analysis, it manipulates materials at the atomic level on an industrial scale.

Tokyo Electron Limited: Tokyo Electron Limited is a global leading company of innovative semiconductor production equipment. It is the only manufacturer in the world with a product portfolio that covers four sequential patterning processes. It offers various products in semiconductor production equipment such as Coater, etch, cleaning, deposition, test, wafer bonder, wafer edge trimming, wafer thinning system etc. Company’s field solutions business takes advantage of the largest installed base in the industry (exceed 86,000 units), while also employing the latest AI, digital technologies, and knowledge management tools to boost the efficiency of service.

The business expansion activities are increasing substantially in ALD equipment market for chemical application. For example, Applied Materials, Inc. has announced acquisition of Picosun Oy, a privately held semiconductor equipment company based in Espoo, Finland. Picosun is an innovator in atomic layer deposition (ALD) technology, primarily for specialty semiconductors. Such strategies are playing a crucial role in the development of the market.

Key Companies in the ALD Equipment for Chemical Application Market includes

• Applied Materials, Inc.


• Tokyo Electron Limited


• Lam Research Corporation


• Veeco Instruments Inc


• Kurt J. Lesker Company


• Eugenus Inc.


• Beneq


• Forge Nano


• ANRIC Technologies


• Levitech

ALD Equipment Market Report for Chemical Application Industry Developments

June 2021:  Applied Materials has developed a new materials engineering solution called the Endura Copper Barrier Seed IMS. It is an Integrated Materials Solution that combines seven different process technologies in one system under high vacuum: ALD, PVD, CVD, copper reflow, surface treatment, interface engineering and metrology. The combination replaces conformal ALD with selective ALD, eliminating a high-resistivity barrier at the via interface.

June 2020: The Nanoelectronic Devices and Circuits Lab, in collaboration with Purdue University and Kurt J. Lesker Company has developed conformal atomic layer deposition (ALD) based hafnium zirconium oxide thin film processes displaying excellent electrical properties for potential gate oxide complement or replacement in scaled logic and memory technology nodes.

ALD Equipment for Chemical Application Market Segmentation

ALD Equipment Market Report for Chemical Application Wafer Size Outlook

• Up to 150 mm


• 200 mm


• 300 mm

ALD Equipment Market Report for Chemical Application Deposition Method Outlook

• Plasma-Enhanced


• Thermal


• Spatial


• Roll-to-Roll


• Powder


• Others

ALD Equipment Market Report for Chemical Application Film Type Outlook

• Oxide


• Metal


• Sulfide


• Nitride


• Flouride

ALD Equipment Market Report for Chemical Application Application Outlook

• Catalyst Deposition


• Surface Modification


• Others

ALD Equipment Market Report for Chemical Application Regional Outlook

• North America
  
  
  
  • US
  
  
  • Canada
  
  
  • Mexico
  
  
  
  


• Europe
  
  
  
  • Germany
  
  
  • Italy
  
  
  • France
  
  
  • Spain
  
  
  • UK
  
  
  • Poland
  
  
  • Netherlands
  
  
  • Rest of Europe
  
  
  
  


• Asia-Pacific
  
  
  
  • China
  
  
  • India
  
  
  • Japan
  
  
  • South Korea
  
  
  • Australia
  
  
  • Malaysia
  
  
  • Indonesia
  
  
  • Rest of Asia-Pacific
  
  
  
  


• South America
  
  
  
  • Brazil
  
  
  • Argentina
  
  
  • Rest of South America
  
  
  
  


• Middle East & Africa
  
  
  
  • Saudi Arabia
  
  
  • UAE
  
  
  • South Africa
  
  
  • Rest of Middle East & Africa