Increasing Demand for the Miniaturization of Electronic Devices is Anticipated to Fuel the Growth of the Global Photolithography Market During the Forecast Period 2022 - 2030 :

Pune, India, October 2019, MRFR Press Release/- Market Research Future has published a Half-Cooked Research Report on the Global Photolithography Market.


Market Highlights


The global photolithography market is expected to depict a significant market growth during the forecast period. Photolithography is an optical medium used to transfer patterns onto a substrate. The patterns are first transferred to an imagable photoresist layer. The photoresist is a liquid film that can be spread out on a substrate and developed into a selectively placed layer for subsequent processing. Photolithography can etch a pattern into an integrated circuit using just a single beam of ultraviolet light. The process does not require any additional material for etching; thus, it becomes a highly efficient and cost-effective solution for producing extremely small incisions in a substrate. Photolithography is also used to control the exact size and shape of the entire substrate. Increasing miniaturization of electronic devices has attributed to the growth of the global photolithography market. However, the complex manufacturing process of semiconductor devices might act as a restraining factor to the growth of the global photolithography market.


The Global Photolithography Market has been segmented on the basis of process, application, and region.


Key Players


The key players in the photolithography market are identified across all the major regions based on their countries of origin, presence across different regions, recent key developments, product diversification, and industry expertise. Some of them are Samsung Electronics (South Korea), Carl Zeiss AG (Germany), ASML Holding NV (Netherlands), Applied Materials, Inc. (US), Taiwan Semiconductor Manufacturing Company Limited (Taiwan), Shanghai Micro Electronics Equipment (Group) Co., Ltd. (SMEE) (China), EV Group (EVG) (Austria), Veeco Instruments Inc. (US), SÜSS MICROTEC SE (Germany), NuFlare Technology Inc. (Japan), Tokyo Electron Limited (Japan), Vistec Electron Beam GmbH (Germany), JEOL Ltd (Japan), Rudolph Technologies, Inc. (US), and NIL TECHNOLOGY (Denmark). The companies are focused on innovating in their existing product portfolio as well as innovate new products by investing in research and development to analyze the changing market trends.


Access Report Details @ https://www.marketresearchfuture.com/reports/photolithography-market-8463


Regional Analysis


The market for photolithography is estimated to register significant growth during the forecast period from 2019 to 2025. The geographic analysis of photolithography market has been conducted for North America, Europe, Asia-Pacific, the Middle East & Africa, and Central & South America. According to MRFR analysis, Asia-Pacific dominated the global photolithography market in 2018 and is expected to maintain its dominance during the forecast period. The presence of several wafer fabrication facilities and semiconductor equipment manufacturers such as Taiwan Semiconductor Manufacturing Company Limited, Shanghai Micro Electronics Equipment (Group) Co., Ltd, and Tokyo Electron Limited has contributed to the growth of photolithography market in Asia-Pacific. Moreover, the adoption of miniaturization techniques for the development of portable electronic devices is also estimated to fuel the growth of the market in Asia-Pacific. On the other hand, the market in North America is expected to register the fastest growth during the forecast period 2019–2025. The demand for developing advanced and highly powerful microprocessors has encouraged US-based manufacturers to adopt EUV lithography process. This, in turn, is expected to create opportunities for vendors in the photolithography market in North America in the near future.